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Journal of Plasma Chemistry and Plasma Processing Research(JPCPPR)

ISSN: 2834-359X | DOI: 10.33140/JPCPPR

Impact Factor: 1.20*

About the Journal

Journal DOI: 10.33140/JPCPPR

Editorial Panel View Editorial Board

Mingli Li , PhD
Department of Systems Biology Beckman Research Institute of City of Hope, Beckman Research Institute, United States

Jeffery
Editorial Manager

Li-Xue Jiang
Department of Chemistry Purdue University, USA

Yang Wei
Department of Chemistry Loyola University , USA

Journal of Plasma Chemistry and Plasma Processing Research provides the publications of recent advancements and fundamental research in this field. Plasma is an ionized gas, a precise fourth state of matter. “Ionized” means a minimum of 1 electron isn't bound to an atom or molecule, converting the atoms or molecules into charged ions. As temperature increases, molecules become more energetic and transform matter within the sequence: solid, liquid, gas, and eventually plasma.

Target audiences:
Plasma Chemists
Physicists
Pharmacists
Directors from Companies
Academicians
University Professors
Young Researchers
Research Scientists
Research Scholars and students

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